Most Cited Patents

image 92
a graph showing an out-of-plane XRD pattern representing the crystallinity of a single-crystal LnCuOXX solid-solution thin film produced.
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a graph showing an out-of-plane XRD pattern representing the crystallinity of a LnCuOX film produced.
3,566 citations – LnCuO(S, Se, Te)monocrystalline thin film, its manufacturing method, and optical device or electronic device using the monocrystalline thin film.
Date of Patent: Jan. 29, 2008

Inventors: Hideo HosonoMasahiro HiranoHiromichi OtaMasahiro OritaHidenori HiramatsuKazushige Ueda.

The disclosed method involves producing a high-quality LnCuOX single-crystal thin film. It includes growing a base thin film on a single-crystal substrate, depositing an amorphous or polycrystalline LnCuOX thin film on top to form a laminated film, and annealing the laminated film at a temperature of 500°C or higher. This method enables the growth of a thin film with excellent crystallinity suitable for use in light-emitting diodes, semiconductor lasers, field-effect transistors, and hetero-bipolar transistors, surpassing the limitations of conventional polycrystalline films.


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shows schematically a cross-sectional of indium oxide-based TFT according to this invention with a top gate electrode configuration and with intermediate electrodes.
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shows a simplified schematic diagram of a two-dimensional display or imaging array.
3,563 citations – Indium oxide-based thin film transistors and circuits.
Date of Patent: May. 01, 2007

Inventors: Yi-Chi ShihCindy Xing QiuIshiang Shih, Chunong Qiu

This invention relates to thin film transistors and circuits with indium oxide-based channel layers. These components can be fabricated at low temperatures on various substrates, including flexible and transparent ones. They offer high charge carrier mobilities, making them suitable for electronic display and imaging applications. The invention also provides methods for fabricating these thin film transistors with indium oxide-based channels.

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