The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2017

Filed:

Jun. 30, 2015
Applicant:

Nichia Corporation, Anan-shi, Tokushima, JP;

Inventor:

Koji Tanizawa, Tokushima, JP;

Assignee:

NICHIA CORPORATION, Anan-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/15 (2005.12); H01L 31/0352 (2005.12); H01L 31/0304 (2005.12); B82Y 20/00 (2010.12); H01L 29/12 (2005.12); H01L 33/00 (2009.12); H01L 29/06 (2005.12); H01L 31/0735 (2011.12); H01S 5/343 (2005.12); H01L 31/18 (2005.12); H01L 33/32 (2009.12); H01S 5/34 (2005.12); H01L 33/06 (2009.12); H01L 33/02 (2009.12); H01S 5/30 (2005.12);
U.S. Cl.
CPC ...
B82Y 20/00 (2012.12); H01L 31/03042 (2012.12); H01L 31/03046 (2012.12); H01L 31/035236 (2012.12); H01L 31/0735 (2012.12); H01L 31/1852 (2012.12); H01L 33/025 (2012.12); H01L 33/06 (2012.12); H01L 33/32 (2012.12); H01S 5/34333 (2012.12); H01S 5/305 (2012.12); H01S 5/309 (2012.12); H01S 5/3086 (2012.12); H01S 5/3407 (2012.12); Y02E 10/544 (2012.12);
Abstract

An nitride semiconductor device for the improvement of lower operational voltage or increased emitting output, comprises an active layer comprising quantum well layer or layers and barrier layer or layers between n-type nitride. semiconductor layers and p-type nitride semiconductor layers, wherein said quantum layer in said active layer comprises InxGa1−xN (0<x<1) having a peak wavelength of 450 to 540 nm and said active layer comprises laminating layers of 9 to 13, in which at most 3 layers from the side of said n-type nitride semiconductor layers are doped with an n-type impurity selected from the group consisting of Si, Ge and Sn in a range of 5×10to 2×10/cm.


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