The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2016

Filed:

Aug. 22, 2012
Applicants:

Akira Terakawa, Hirakata, JP;

Toshio Asaumi, Kobe, JP;

Inventors:

Akira Terakawa, Hirakata, JP;

Toshio Asaumi, Kobe, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 25/00 (2005.12); H01L 31/0747 (2011.12); H01L 31/0224 (2005.12); H01L 31/0352 (2005.12);
U.S. Cl.
CPC ...
H01L 31/0747 (2012.12); H01L 31/022466 (2012.12); H01L 31/035272 (2012.12); Y02E 10/50 (2012.12);
Abstract

In a photovoltaic cell, an i-type amorphous silicon film and an n-type amorphous silicon film are formed in a region excluding a predetermined width of an outer periphery on a main surface of an n-type single crystalline silicon substrate. A front electrode is formed so as to cover the i-type amorphous silicon film and the n-type amorphous silicon film on a main surface of the n-type single crystalline silicon substrate. An i-type amorphous silicon film and a p-type amorphous silicon film are formed on the entire area of a back surface of the n-type single crystalline silicon substrate. A back electrode is formed in a region excluding a predetermined width of an outer periphery on the p-type amorphous silicon film. A surface, on the side of the front electrode, of the photovoltaic cell is a primary light incidence surface.


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