The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2015

Filed:

May. 14, 2014
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Koichi Maeda, Akashi, JP;

Masanori Morikawa, Akashi, JP;

Yuki Matsuoka, Akashi, JP;

Natsuki Ichimiya, Akashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2005.12); B23F 21/00 (2005.12); C23C 14/06 (2005.12); C23C 28/00 (2005.12); C23C 28/04 (2005.12); C23C 30/00 (2005.12); C23C 14/00 (2005.12);
U.S. Cl.
CPC ...
B23F 21/00 (2012.12); C23C 14/0021 (2012.12); C23C 14/0641 (2012.12); C23C 28/044 (2012.12); C23C 28/42 (2012.12); C23C 30/005 (2012.12); Y10T 407/17 (2015.01); Y10T 407/1948 (2015.01); Y10T 408/78 (2015.01); Y10T 428/24975 (2015.01); Y10T 428/265 (2015.01);
Abstract

This invention provides a surface-coated cutting tool which exhibits excellent fracture resistance and wear resistance in high-speed cutting, such as high-speed gear cutting, high-speed milling, and high-speed drilling. The surface-coated cutting tool includes a hard coating layer composed of an alternately laminated layer structure of at least a thin layer A and a thin layer B formed on the surface of a tool substrate, such as a cemented carbide substrate, a cermet substrate, and a high-speed tool steel substrate. The thin layer A is an (Al, Cr, Si)N layer which satisfies a compositional formula: [AlCrSi]N (0.2≦X≦0.45, 0.4≦Y≦0.75, 0.01≦Z≦0.2, and X+Y+Z=1 in terms of atomic ratio). The thin layer B is an (Al, Ti, Si)N layer which satisfies a compositional formula: [AlTiSi]N (0.05≦U≦0.75, 0.15≦V≦0.94, 0.01≦W≦0.1, and U+V+W=1 in terms of atomic ratio).


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