The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2007

Filed:

May. 27, 2004
Applicants:

Ravindra A. Athale, Burke, VA (US);

Joseph Van Der Gracht, Columbia, MD (US);

Inventors:

Ravindra A. Athale, Burke, VA (US);

Joseph van der Gracht, Columbia, MD (US);

Assignee:

HoloSpex, Inc., Columbia, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 (2005.12);
U.S. Cl.
CPC ...
Abstract

This invention pertains to the design of optimized far field viewing devices that simultaneously produce bright far field holographic light patterns and achieve good see-through performance to present a well focused scene. A far field transmission hologram recorded on a transparent substrate has regions having high diffraction efficiency juxtaposed with regions having low diffraction efficiency. The high diffraction efficiency regions contribute to production of bright far field holographic light patterns, whereas the low diffraction efficiency regions contribute to see-through performance.


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