The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2002
Filed:
Oct. 22, 1997
M. Joe Roberts, Ridgecrest, CA (US);
Geoff A. Lindsay, Ridgecrest, CA (US);
Kenneth J. Wynne, Falls Church, VA (US);
Andrew P. Chafin, Ridgecrest, CA (US);
John D. Stenger-Smith, Ridgecrest, CA (US);
Peter Zarras, Ridgecrest, CA (US);
Rena Y. Yee, Ridgecrest, CA (US);
Richard A. Holloins, Ridgecrest, CA (US);
The United States of America as represented by the Seceretary of the Navy, Washington, DC (US);
Abstract
A process that lends itself to automation for producing multi-layer second-order nonlinear optical polymer (NLOP) thin films by the forming of a polycation layer containing an NLO-active cationic polymer, having non-centrosymmetric chromophores, on a substrate followed by the forming of a polyanion layer, also having non-centrosymmetric chromophores, on the polycation layer. A predetermind number of the polycation and the polyanion layers may be alternated upon the surface as well as one or more buffer layers. An added benefit is the formation of an ultra-smooth surface of the same order of roughness as the substrate upon which the layers are formed.