The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2018
Filed:
Apr. 06, 2016
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Youngmin Moon, Yongin-si, KR;
Sungsoon Im, Yongin-si, KR;
Minho Moon, Yongin-si, KR;
Soonchul Chang, Yongin-si, KR;
Assignee:
Samsung Display Co., LTd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C25F 3/00 (2006.01); B23P 15/00 (2006.01); C03C 25/00 (2018.01); C23F 1/00 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); B44C 1/22 (2006.01); B23K 26/384 (2014.01); B23K 26/00 (2014.01); B23K 26/40 (2014.01); C23C 14/04 (2006.01); H01L 51/00 (2006.01); B23K 103/18 (2006.01);
U.S. Cl.
CPC ...
B23K 26/384 (2015.10); B23K 26/0093 (2013.01); B23K 26/40 (2013.01); C23C 14/042 (2013.01); B23K 2203/26 (2015.10); H01L 51/0011 (2013.01);
Abstract
A method of manufacturing a mask includes forming a first hole in a base material using a laser, the first hole penetrating through the base material from a first surface to a second surface different than the first surface, and expanding the first hole using an etchant to form a second hole.