The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2018

Filed:

Apr. 26, 2017
Applicants:

Ananda H. Kumar, Fremont, CA (US);

Srinivas H. Kumar, Fremont, CA (US);

Tue Nguyen, Fremont, CA (US);

Inventors:

Ananda H. Kumar, Fremont, CA (US);

Srinivas H. Kumar, Fremont, CA (US);

Tue Nguyen, Fremont, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/02 (2006.01); H01L 29/20 (2006.01); C30B 1/02 (2006.01); C30B 29/06 (2006.01); C30B 25/18 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0245 (2013.01); C30B 1/026 (2013.01); C30B 25/18 (2013.01); C30B 29/06 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02422 (2013.01); H01L 29/2003 (2013.01);
Abstract

A composite substrate includes a single crystal silicon layer on a glass or glass ceramic layer on a support layer can be used to form GaN layer without cracks. The glass or glass ceramic layer can have a set point and/or strain point below the deposition temperature of GaN, which can assist in releasing stress in the deposited GaN layer. Additionally, the composite substrate can be exposed to a heated and dry hydrogen ambient to reduce an oxide layer between the silicon layer and the glass or glass ceramic layer, to allow the formation of free standing GaN layer.


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