The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2018
Filed:
Jan. 29, 2016
Basf SE, Ludwigshafen, DE;
Keita Tanaka, Nishinomiya, JP;
Yuki Matsuoka, Nishinomiya, JP;
Kazuhiko Kunimoto, Kawanishi, JP;
Toshikage Asakura, Minoo, JP;
Hisatoshi Kura, Takarazuka, JP;
BASF SE, Ludwigshafen, DE;
Abstract
Compounds of the formula (I) and (IA) wherein X is —O(CO)—; Ris C-Chaloalkyl or C-Chaloaryl; Ris located in position 7 of the coumarinyl ring and is OR; Ra, Rb and RC independently of each other are hydrogen; Ris C-Chaloalkyl or C-Chaloalkyl; Ris hydrogen; and Ris C-CalkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).