The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2018
Filed:
Mar. 04, 2014
Applicants:
Juergen Erwin Lang, Karlsruhe, DE;
Hartwig Rauleder, Rheinfelden, DE;
Ekkehard Mueh, Rheinfelden, DE;
Imad Moussallem, Hanau, DE;
Inventors:
Juergen Erwin Lang, Karlsruhe, DE;
Hartwig Rauleder, Rheinfelden, DE;
Ekkehard Mueh, Rheinfelden, DE;
Imad Moussallem, Hanau, DE;
Assignee:
Evonik Degussa GmbH, Essen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/107 (2006.01); B01J 19/08 (2006.01); C08G 77/60 (2006.01);
U.S. Cl.
CPC ...
C01B 33/10773 (2013.01); B01J 19/088 (2013.01); C08G 77/60 (2013.01); B01J 2219/0805 (2013.01); B01J 2219/0871 (2013.01); B01J 2219/0883 (2013.01); B01J 2219/0898 (2013.01); Y02P 20/582 (2015.11);
Abstract
The invention relates to a process and an apparatus for preparation of polychlorosilanes from monomeric chlorosilanes, by subjecting the chlorosilanes to a thermal plasma.