The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9993895 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 12, 2018

Filed:

Mar. 18, 2010
Applicants:

Charles Boegli, Marin, CH;

Steffen Weissmantel, Chemnitz, DE;

Günter Reisse, Chemnitz, DE;

Andy Engel, Colditz, DE;

Rene Boettcher, Mittweida, DE;

Werner Steffen, Stansstad, CH;

Inventors:

Charles Boegli, Marin, CH;

Steffen Weissmantel, Chemnitz, DE;

Günter Reisse, Chemnitz, DE;

Andy Engel, Colditz, DE;

Rene Boettcher, Mittweida, DE;

Werner Steffen, Stansstad, CH;

Assignee:

Boegli-Gravures SA, Marin, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B42D 15/00 (2006.01); B42D 15/10 (2006.01); B23K 26/06 (2014.01); B41M 5/24 (2006.01); B44B 5/02 (2006.01); B42D 25/425 (2014.01); B23K 26/0622 (2014.01); B23K 26/066 (2014.01); B23K 26/40 (2014.01); B42D 25/328 (2014.01); B23K 103/16 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0604 (2013.01); B23K 26/0084 (2013.01); B23K 26/066 (2015.10); B23K 26/0622 (2015.10); B23K 26/0624 (2015.10); B23K 26/40 (2013.01); B41M 5/24 (2013.01); B42D 25/425 (2014.10); B44B 5/026 (2013.01); B23K 2203/172 (2015.10); B42D 25/328 (2014.10);
Abstract

In the method for structuring at least one area of a solid body surface provided with a ta-C coating, by means of a first laser, preferably an excimer laser having pulse durations in the nanosecond range, a first structure is produced upon which a second, ripple-like structure is superposed by means of a second laser, preferably having pulse durations in the femtosecond range. Preferentially, the excimer laser structuring is carried out according to the mask projection technique and the femtosecond laser structuring according to the focus technique. This method allows the rational manufacture of very complex, extremely fraud-resistant authentication features and/or of esthetically attractive, optical diffraction effective colored patterns.


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