The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Nov. 29, 2017
Applicant:
Ams Ag, Unterpremstaetten, AT;
Inventors:
Assignee:
ams AG, Unterpremstaetten, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/66 (2006.01); G02B 21/00 (2006.01); H01L 21/3065 (2006.01); H01L 21/02 (2006.01); G01N 21/88 (2006.01); G01N 21/64 (2006.01); G01N 21/94 (2006.01); G01N 21/91 (2006.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G01N 21/643 (2013.01); G01N 21/6458 (2013.01); G02B 21/00 (2013.01); G02B 21/0076 (2013.01); H01L 21/02057 (2013.01); H01L 21/3065 (2013.01); H01L 22/10 (2013.01); G01N 21/91 (2013.01); G01N 21/94 (2013.01); G01N 2021/646 (2013.01); G01N 2021/8864 (2013.01); G01N 2021/8877 (2013.01);
Abstract
According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.