The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jun. 23, 2017
Orthogonal, Inc., Rochester, NY (US);
Douglas Robert Robello, Webster, NY (US);
Terrence Robert O'Toole, Webster, NY (US);
Frank Xavier Byrne, Webster, NY (US);
Diane Carol Freeman, Pittsford, NY (US);
Charles Warren Wright, Fairport, NY (US);
Sandra Rubsam, Webster, NY (US);
Kenneth Nicholas Boblak, Oakland, CA (US);
Meng Zhao, Beijing, CN;
ORTHOGONAL, INC., Rochester, NY (US);
Abstract
A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.