The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jun. 05, 2017
Jeehwan Kim, Cambridge, MA (US);
Dirk Robert Englund, Cambridge, MA (US);
Mark A. Hollis, Concord, MA (US);
Travis Wade, Harvard, MA (US);
Michael Geis, Acton, MA (US);
Richard Molnar, Harvard, MA (US);
Jeehwan Kim, Cambridge, MA (US);
Dirk Robert Englund, Cambridge, MA (US);
Mark A. Hollis, Concord, MA (US);
Travis Wade, Harvard, MA (US);
Michael Geis, Acton, MA (US);
Richard Molnar, Harvard, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A buffer layer is employed to fabricate diamond membranes and allow reuse of diamond substrates. In this approach, diamond membranes are fabricated on the buffer layer, which in turn is disposed on a diamond substrate that is lattice-matched to the diamond membrane. The weak bonding between the buffer layer and the diamond substrate allows ready release of the fabricated diamond membrane. The released diamond membrane is transferred to another substrate to fabricate diamond devices, while the diamond substrate is reused for another fabrication.