The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2018

Filed:

Jun. 06, 2017
Applicants:

Tsinghua University, Beijing, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Peng Liu, Beijing, CN;

Wei Zhao, Beijing, CN;

Xiao-Yang Lin, Beijing, CN;

Duan-Liang Zhou, Beijing, CN;

Chun-Hai Zhang, Beijing, CN;

Kai-Li Jiang, Beijing, CN;

Shou-Shan Fan, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/295 (2006.01); H01J 37/18 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/295 (2013.01); H01J 37/18 (2013.01); H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01J 2237/063 (2013.01); H01J 2237/182 (2013.01);
Abstract

The disclosure relates to a low energy electron microscopy. The electron microscopy includes a vacuum chamber; an electron gun used to emit electron beam; a diffraction chamber; an imaging device; a sample holder used to fix two-dimensional nanomaterial sample; a vacuum pumping device; and a control computer. The electron beam transmits the sample to form a transmission electron beam and diffraction electron beam. The control computer includes a switching module to switch the work mode between a large beam spot diffraction imaging mode and small beam spot diffraction imaging mode.


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