The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jun. 17, 2015
Boe Technology Group Co., Ltd., Beijing, CN;
Hefei Boe Optoelectronics Technology Co., Ltd., Hefei, Anhui Province, CN;
Xuepei Cheng, Beijing, CN;
Dongdong Yin, Beijing, CN;
Xuequan Yu, Beijing, CN;
Zhiqiang Li, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Hefei, Anhui Province, CN;
Abstract
A mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer are disclosed. The mask plate includes a plurality of first regions, each of the plurality of first regions corresponding to each subpixel unit; and a second region between two adjacent first regions. Each first region is respectively provided with one first subregion for forming a color filter layer pattern within an opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer. The first subregion is between the two second subregions. In each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.