The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2018

Filed:

Dec. 18, 2014
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Jeremy Daniel Van Dam, West Coxsackie, NY (US);

Joseph John Zierer, Jr., Niskayuna, NY (US);

Michael Franklin Hughes, Oklahoma City, OK (US);

Zhipeng Zhang, Santa Clara, CA (US);

Assignee:

GENERAL ELECTRIC COMPANY, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
E21B 43/12 (2006.01); E21B 34/08 (2006.01); E21B 43/32 (2006.01); F16K 33/00 (2006.01);
U.S. Cl.
CPC ...
E21B 34/08 (2013.01); E21B 43/121 (2013.01); E21B 43/32 (2013.01); F16K 33/00 (2013.01);
Abstract

A flow control system is provided for a horizontal well production system having a casing, a tube having an intake opening and disposed within the casing, and a gap formed between the casing and the tube. The flow control system includes a valve having an orifice, coupled to the tube and disposed proximate to the intake opening. The flow control system further includes an actuator coupled to the valve and configured to open the valve in response to a presence of a liquid in the gap, proximate to the intake opening, to permit flow of the liquid into the tube via the intake opening, and to close the valve in response to a presence of a gas in the gap, proximate to the intake opening, to prevent flow of the gas into the tube via the intake opening.


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