The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jan. 25, 2013
Applicant:
National University Corporation Gunma University, Maebashi-shi, Gunma, JP;
Inventor:
Tetsuo Okutsu, Kiryu, JP;
Assignee:
National University Corporation Gunma University, Maebashi-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/58 (2006.01); B01J 19/08 (2006.01); C30B 7/00 (2006.01); C12N 9/36 (2006.01); C23C 14/18 (2006.01);
U.S. Cl.
CPC ...
B01J 19/08 (2013.01); C12N 9/2462 (2013.01); C23C 14/18 (2013.01); C30B 7/00 (2013.01); C30B 29/58 (2013.01); B01J 2219/0879 (2013.01); Y10T 428/24355 (2015.01);
Abstract
A crystallization substrate of the present invention includes a noble metal vapor-deposited film having an absorbance in a 500 to 1,000 nm wavelength range and formed in all or part of one surface of the substrate. The noble metal vapor-deposited film has an average thickness of 0.1 to 60 nm. The noble metal vapor-deposited film is a continuous film with a pit formed by vapor deposition in part of the film and surrounded by the continuous film.