The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2018

Filed:

Jul. 27, 2012
Applicants:

Boong Kim, Cheonan-si, KR;

OH Jin Kwon, Cheonan-si, KR;

Sungho Jang, Cheonan-si, KR;

Joo Jib Park, Asan-si, KR;

Inventors:

Boong Kim, Cheonan-si, KR;

Oh Jin Kwon, Cheonan-si, KR;

Sungho Jang, Cheonan-si, KR;

Joo Jib Park, Asan-si, KR;

Assignee:

Semes Co., Ltd., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 25/14 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); H01L 21/683 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67028 (2013.01); F26B 25/14 (2013.01); H01L 21/6719 (2013.01); H01L 21/67034 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); H01L 21/67126 (2013.01); H01L 21/67178 (2013.01); H01L 21/67748 (2013.01); H01L 21/6875 (2013.01);
Abstract

Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.


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