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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9983481 B1

PDFFull Text
Date of Patent:
May. 29, 2018

Filed:

Aug. 18, 2015

Stripper composition for removing photoresists and method for stripping photoresists using the same

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Tae Moon Park, Daejeon, KR;

Dae Chul Jung, Daejeon, KR;

Dong Hoon Lee, Daejeon, KR;

Woo Ram Lee, Daejeon, KR;

Hyun Jun Lee, Daejeon, KR;

Ju Young Kim, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:

Rothwell, Figg, Ernst & Manbeck, P.C.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/42 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); C11D 3/00 (2006.01); C11D 3/20 (2006.01); C11D 3/28 (2006.01); C11D 3/30 (2006.01); C11D 3/32 (2006.01); C11D 3/37 (2006.01); C11D 3/43 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/42 (2013.01); C11D 3/0073 (2013.01); C11D 3/2068 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); C11D 3/32 (2013.01); C11D 3/373 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01); G03F 7/11 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01); G03F 7/425 (2013.01); G03F 7/426 (2013.01); H01L 21/0206 (2013.01); H01L 21/0274 (2013.01); H01L 21/0276 (2013.01);
Abstract

The present invention relates to a stripper composition for removing photoresists which comprises: a chained amine compound having a weight average molecular weight of more than 95 g/mol; a chained amine compound having a weight average molecular weight of not more than 90 g/mol; a cyclic amine compound; an amide-based compound in which a linear or branched alkyl group having 1-5 carbon atoms is mono- or di-substituted with nitrogen; and a polar organic solvent, wherein the weight ratio of the chained amine compound having a weight average molecular weight of more than 95 g/mol to the chained amine compound having the weight average molecular weight of not more than 90 g/mol is 1:1 to 1:10, and a method for stripping a photoresist using the same.

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