The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Oct. 08, 2013
The United States of America As Represented BY the Secretary of the Army, Washington, DC (US);
Beam Engineering for Advanced Measurements Co., Orlando, FL (US);
Nelson V. Tabirian, Winter Park, FL (US);
Sarik R. Nersisyan, Maitland, FL (US);
Brian R. Kimball, Shrewsbury, MA (US);
Diane M. Steeves, Franklin, MA (US);
Beam Engineering for Advanced Measurements Co., Orlando, FL (US);
The United States of America as Represented by the Secretary of the Army, Washington, DC (US);
Abstract
An apparatus and method for fabricating high quality one- or two-dimensional diffractive waveplates and arrays that exhibit high diffraction efficiency and capable of inexpensive large volume production. A generally non-holographic and aperiodic polarization converter for converting the polarization of a coherent input light beam of a visible wavelength into a pattern of continuous spatial modulation at the output of the polarization converter. A photoresponsive material characterized by an anisotropy axis according to polarization of the light beam is exposed to a polarization modulation pattern and coated subsequently with an anisotropic material overlayer with ability of producing an optical axis orientation according to and under the influence of the anisotropy axis of the photoresponsive material layer. The diffractive waveplates are obtained when exposure time of photoresponsive material layer exceeds an order of magnitude the time period that is known to produce spatially homogeneous orientation of the anisotropic overlayer.