The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Jan. 31, 2017
Applicant:
GM Global Technology Operations Llc, Detroit, MI (US);
Inventor:
Adam P. Rabe, Auburn Hills, MI (US);
Assignee:
GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); C23F 1/36 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C23F 1/36 (2013.01); C09G 1/02 (2013.01); C09K 3/1409 (2013.01);
Abstract
An aluminum alloy article having improved surface contrast and an associated method are provided. The method includes grinding a surface of the article, diamond polishing the surface of the article, and removing α-aluminum matrix material from the surface by fine polishing the surface with a suspension containing colloidal silica and a caustic substance, wherein the caustic substance has a higher pH value than the pH value of colloidal silica.
Rabe, Adam. (2018). Chemical mechanical polishing for improved contrast resolution (U.S. Patent No. 9982351). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9982351
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile