The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Jan. 20, 2011
Tomohiro Iwano, Hitachi, JP;
Hirotaka Akimoto, Hitachi, JP;
Takenori Narita, Hitachi, JP;
Tadahiro Kimura, Hitachi, JP;
Daisuke Ryuzaki, Kokubunji, JP;
Tomohiro Iwano, Hitachi, JP;
Hirotaka Akimoto, Hitachi, JP;
Takenori Narita, Hitachi, JP;
Tadahiro Kimura, Hitachi, JP;
Daisuke Ryuzaki, Kokubunji, JP;
HITACHI CHEMICAL COMPANY, LTD, Tokyo, JP;
Abstract
A slurry includes abrasive grains and water, wherein the abrasive grains include tetravalent cerium hydroxide particles and produce light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with the content of the abrasive grains adjusted to 1.0 mass %. A polishing liquid includes abrasive grains, an additive and water, wherein the abrasive grains include tetravalent cerium hydroxide particles and produce light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with the content of the abrasive grains adjusted to 1.0 mass %.