The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
May. 22, 2013
Applicant:
Industrial Technology Research Institute, Chutung, Hsinchu, TW;
Inventors:
Chih-Cheng Lin, Hsinchu, TW;
Chyi-Ming Leu, Hsinchu County, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 79/08 (2006.01); C08K 3/36 (2006.01); C08J 7/12 (2006.01); C08K 3/20 (2006.01); C08K 3/22 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
C08K 3/20 (2013.01); C08K 3/22 (2013.01); C08K 3/36 (2013.01); C08J 7/12 (2013.01); C08J 2379/08 (2013.01); C08K 2003/2227 (2013.01); H05K 1/0346 (2013.01); H05K 2201/0154 (2013.01); H05K 2201/0209 (2013.01); H05K 2203/0769 (2013.01); H05K 2203/0793 (2013.01); Y10T 428/259 (2015.01); Y10T 428/31721 (2015.04);
Abstract
The disclosure provides a polyimide-containing layer suitable for being etched by an alkaline solution and a method for etching a polyimide-containing layer. The polyimide-containing layer suitable for being etched by an alkaline solution includes 20-50 parts by weight of a silica dioxide, and 50-80 parts by weight of a polyimide.