The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Oct. 02, 2015
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Tetsuro Okuda, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/227 (2006.01); H01S 5/22 (2006.01); H01S 3/08 (2006.01); H01S 5/062 (2006.01); H01S 5/343 (2006.01);
U.S. Cl.
CPC ...
H01S 5/2275 (2013.01); H01S 5/2222 (2013.01); H01S 5/2272 (2013.01); H01S 3/08022 (2013.01); H01S 5/06226 (2013.01); H01S 5/222 (2013.01); H01S 5/2224 (2013.01); H01S 5/34306 (2013.01); H01S 2304/04 (2013.01);
Abstract

In a semiconductor laser, a block layer is provided on both sides of a mesa-type semiconductor part having an n-type cladding layer, an active layer, and a p-type cladding layer. The block layer has: a p-type block layer formed on the side surface of the mesa-type semiconductor part and over a p-type semiconductor substrate; a high-resistance layer formed over the p-type block layer; and an n-type block layer formed over the high-resistance layer, which has a higher resistance than that of the p-type block layer. By providing the high-resistance layer between the p-type block layer and the n-type block layer, the thickness of the p-type block layer can be controlled and a leakage current (flow of a hole) can be reduced. Further, the distance between the n-type cladding layer and the n-type block layer can be secured, and hence a leakage current (flow of an electron) can be prevented.


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