The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Sep. 14, 2015
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Glen Bennett Cook, Elmira, NY (US);

Ann MeeJin Ferrie, Painted Post, NY (US);

Shawn Michael O'Malley, Horseheads, NY (US);

Vitor Marino Schneider, Painted Post, NY (US);

Assignee:

CORNING INCORPORATED, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 13/00 (2006.01); C30B 29/20 (2006.01); C23C 18/12 (2006.01); C03C 17/25 (2006.01);
U.S. Cl.
CPC ...
C30B 13/00 (2013.01); C03C 17/25 (2013.01); C23C 18/1216 (2013.01); C23C 18/1241 (2013.01); C23C 18/1245 (2013.01); C23C 18/1254 (2013.01); C23C 18/1295 (2013.01); C30B 29/20 (2013.01); C03C 2217/214 (2013.01); C03C 2218/113 (2013.01); C03C 2218/116 (2013.01); C03C 2218/32 (2013.01);
Abstract

A crystallized layer can be formed on a substrate from a precursor layer deposited on a surface of the substrate. The precursor layer can be an oxide, a nitride, a carbide, or an oxynitride. The process for forming the crystallized layer includes melting the precursor layer formed on the surface of the substrate by localized topical heating of the precursor layer and then cooling the melted precursor layer so that it crystallized to form a scratch resistant crystallized layer. The scratch resistant crystallized layer can have a hardness of 15 GPa or greater.


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