The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Jun. 01, 2015
Applicant:
Arkema France, Colombes, FR;
Inventors:
Assignee:
ARKEMA FRANCE, Colombes, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C08L 53/00 (2006.01); C09D 153/00 (2006.01); C08F 297/02 (2006.01); B05D 1/00 (2006.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); B05D 1/005 (2013.01); C08F 297/026 (2013.01); C08L 53/00 (2013.01); G03F 7/0002 (2013.01);
Abstract
The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).
Quick Actions:
Navarro, Christophe. (2018). Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film (U.S. Patent No. 9976053). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9976053
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile