The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Mar. 27, 2015
Applicant:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Inventors:
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Chiyoda-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 67/36 (2006.01); C07C 69/757 (2006.01); C07C 29/141 (2006.01); C07C 29/149 (2006.01); C07C 67/347 (2006.01); C07C 45/50 (2006.01); C07C 47/347 (2006.01); C08G 64/02 (2006.01);
U.S. Cl.
CPC ...
C07C 69/757 (2013.01); C07C 29/141 (2013.01); C07C 29/149 (2013.01); C07C 45/50 (2013.01); C07C 47/347 (2013.01); C07C 67/347 (2013.01); C08G 64/0208 (2013.01); C07C 2603/86 (2017.05);
Abstract
A method for producing a bifunctional compound of formula (1): where Rrepresents COOCH, COOCH, COOCH, COOCHor CHO and Rrepresents H, CHor CH, by subjecting a monoolefin of formula (2): where Rrepresents COOCH, COOCH, COOCH, COOCHor CHO and Rrepresents H, CHor CH, carbon monoxide and hydrogen gases to a hydroformylation reaction in the presence of a rhodium compound and an organic phosphorous compound. Compounds produced.