The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
May. 05, 2015
Csmc Technologies Fab1 Co., Ltd., Wuxi New District, CN;
Yonggang Hu, Wuxi New District, CN;
Guoping Zhou, Wuxi New District, CN;
CSMC TECHNOLOGIES FABI CO., LTD., Wuxi New District, Jiangsu, CN;
Abstract
An MEMS-based method for manufacturing a sensor comprises the steps of: forming a shallow channel () and a support beam () on a front surface of a substrate (); forming a first epitaxial layer () on the front surface of the substrate () to seal the shallow channel (); forming a suspended mesh structure () below the first epitaxial layer (); and forming a deep channel () at a position on a back surface of the substrate () corresponding to the shallow channel (), so that the shallow channel () is in communication with the deep channel (). In the Method of manufacturing a MEMS-based sensor, when a shallow channel is formed on a front surface, a support beam of a mass block is formed, so the etching of a channel is easier to control, the process is more precise, and the uniformity and the homogeneity of the formed support beam are better.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile