The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Jul. 22, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Takuya Hatsui, Tokyo, JP;

Shuichi Tamatsukuri, Asaka, JP;

Souta Takeuchi, Fujisawa, JP;

Kenji Takahashi, Yokohama, JP;

Soichiro Nagamochi, Oita, JP;

Shinya Iwahashi, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/16 (2006.01); B41J 2/14 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1631 (2013.01); B41J 2/1408 (2013.01); B41J 2/14024 (2013.01); B41J 2/14129 (2013.01); B41J 2/1603 (2013.01); B41J 2/1626 (2013.01); B41J 2/1628 (2013.01); B41J 2/1642 (2013.01); Y10T 29/49401 (2015.01);
Abstract

A method for manufacturing a liquid ejection head substrate, in which a heat storage layer, a pair of electrodes extending from the surface of the heat storage layer toward the back surface, a heat-generating resistor layer in contact with the pair of electrodes and the surface of the heat storage layer, and a first cover layer configured to cover the heat-generating resistor layer are stacked, includes the steps of etching the heat-generating resistor layer and the first cover layer by using a mask disposed on a substrate including the heat-generating resistor layer and the first cover layer, removing the mask, and forming a second cover layer configured to cover an end portion of the heat-generating resistor layer in that order.


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