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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9975291 B1

PDFFull Text
Date of Patent:
May. 22, 2018

Filed:

Dec. 19, 2013

Nanostructure and method of manufacturing the same

Applicant:

Dexerials Corporation, Tokyo, JP;

Inventor:

Sohmei Endoh, Utsunomiya, JP;

Assignee:

DEXERIALS CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Alison L Hindenlang

Assistant Examiner:

Jerzi H Moreno Hernandez

Int. Cl.
CPC ...
B29C 59/02 (2006.01); B29C 33/38 (2006.01); B29C 43/02 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); B29C 59/04 (2006.01); G02B 1/118 (2015.01); G03F 7/00 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B29C 59/022 (2013.01); B29C 33/38 (2013.01); B29C 33/3842 (2013.01); B29C 43/021 (2013.01); B29C 59/04 (2013.01); G02B 1/118 (2013.01); G03F 7/0002 (2013.01); G03F 7/20 (2013.01); G03F 7/2053 (2013.01); G03F 7/32 (2013.01); G03F 7/70383 (2013.01); B29C 2059/023 (2013.01); B29K 2833/04 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

A nanostructure that is visually recognized as being seamless by its more regularly and more uniformly formed fine concave-convex structure and that exhibits an excellent antireflection effect against light in a visible wavelength range is provided. Such a nanostructure is configured by a number of rows of tracks each including structures, formed by protrusions or depressions on a surface of a substrate, arranged at a predetermined fine pitch. In this nanostructure, a distance between centers of the structures adjacent to each other across a strip-shaped portion (seam) in which portions with no structures within the predetermined pitch are continuously formed in a track arrangement direction is adjusted so as to prevent visual recognition of the seam.

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