The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Aug. 11, 2016
Nan Ya Plastics Corporation, Taipei, TW;
Te-Chao Liao, Taipei, TW;
Chun-Che Tsao, Taipei, TW;
Wen-Jui Cheng, Taipei, TW;
Tzai-Shing Chen, Taipei, TW;
NAN YA PLASTICS CORPORATION, Taipei, TW;
Abstract
A polishing pad for surface planarization is made by impregnating a polyester-based fibrous fabric with thermosetting resins to form a porous impregnated material, and heating the porous impregnated material to effect changes in shape of the pores such that an integrally formed polishing pad with hard/soft layers of different hardnesses is obtained; the heated side of the polishing pad has high hardness and high cutting/grinding ability, whereas the unheated side maintains the original tiny pores and low hardness; and the polishing pad can produce a buffering effect when subjected to an external force and in turn apply an evenly distributed force to an article being polished.