The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
Mar. 27, 2014
National University Corporation University of Yamanashi, Yamanashi, JP;
Sintokogio, Ltd., Aichi, JP;
National University Corporation Toyohashi University of Technology, Aichi, JP;
Yoshiyuki Noda, Kofu, JP;
Takaaki Tsuji, Kofu, JP;
Makio Suzuki, Toyokawa, JP;
Kazuhiko Terashima, Toyohashi, JP;
National University Corporation University of Yamanashi, Yamanashi, JP;
Sintokogio, Ltd., Aichi, JP;
National University Corporation Toyohashi University of Technology, Aichi, JP;
Abstract
To enable a ladle-tilting automatic pouring device to take less time for identification of the parameters and the device to pour highly precisely by sequentially updating pouring model parameters according to the pouring situation, the present pouring control method is based on a mathematical model of a process from input of control parameters to pouring of molten metal, the method including: identifying, using an optimization technique, a flow rate coefficient, a liquid density, and a pouring start angle that is a tilting angle of the pouring ladle when the flowing of the molten metal starts, which are the control parameters in the mathematical model, based on weight of liquid that flows out of the pouring ladle and tilting angle of the ladle that are measured during pouring, and a command signal that controls the tilting of the pouring ladle; and updating the control parameters to the identified control parameters.