The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Jun. 24, 2015
Applicant:

Semes Co., Ltd., Cheonan-si, Chungcheongnam-do, KR;

Inventors:

Tae Keun Kim, Cheonan-si, KR;

Oh Jin Kwon, Cheonan-si, KR;

Ki Hoon Choi, Cheonan-si, KR;

Assignee:

SEMES Co., Ltd., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/12 (2006.01); B08B 3/10 (2006.01); B08B 7/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 3/10 (2013.01); B08B 3/12 (2013.01); B08B 7/028 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01);
Abstract

Embodiments of the inventive concepts provide an apparatus and a method for treating a substrate. The apparatus includes a substrate support unit supporting the substrate, and a liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle discharging the treatment solution to the substrate, a liquid supply line supplying the treatment solution to the nozzle, a mixing member installed on the liquid supply line, a mixing space formed within the mixing member, and a gas supply line connected to the mixing member to supply a gas into the mixing space. The mixing member includes a body within which the mixing space is formed, and an inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles.


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