The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2018
Filed:
May. 05, 2016
Industry-academic Cooperation Foundation, Yonsei University, Seoul, KR;
Taeyoon Lee, Seoul, KR;
Jonghyun Ahn, Seoul, KR;
Jungmok Seo, Goyang-si, KR;
Seoung Ki Lee, Seoul, KR;
Abstract
Provided is an apparatus and method for controlling a droplet. The apparatus for controlling the droplet does not contaminate/damage a sample, has a high degree of freedom in droplet control, and is capable of being repeatedly used for a long time. An apparatus () for controlling a droplet according to an embodiment includes a flexible substrate () having a hydrophobic or oleophobic surface, a dimple formation unit (), which locally deforms a bottom surface of the flexible substrate () to form a dimple, and a driving unit (), which moves the dimple formation unit () at a lower side of the flexible substrate.