The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Mar. 11, 2016
Raytheon Company, Waltham, MA (US);
Glafkos K. Stratis, Lake Worth, FL (US);
Anton Vanderwyst, Tucson, AZ (US);
Wayne L. Sunne, Tucson, AZ (US);
David G. Derrick, Vail, AZ (US);
James P. Edmiston, Allen, TX (US);
David G. Manzi, Tucson, AZ (US);
Howard C. Choe, Southlake, TX (US);
Alphonso A. Samuel, Tucson, AZ (US);
Raytheon Company, Waltham, MA (US);
Abstract
A sensor system and method of reducing plasma-induced communication inhibition for a main antenna includes using auxiliary antennas for detecting a density of plasma that affects operation of the main antenna, and re-orienting an electromagnetic field around the main antenna in response to the density detected to reduce effect of the plasma on the main antenna. The auxiliary antennas are also operable for data link communication and switchable such if the density of the plasma inhibits receipt or sending of signals by one of the auxiliary antennas, another one of the auxiliary antennas may be used for data link communication.