The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2018

Filed:

Mar. 12, 2013
Applicant:

Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;

Inventors:

Tiansheng Li, Beijing, CN;

Changjiang Yan, Beijing, CN;

Shaoying Xu, Beijing, CN;

Zhenyu Xie, Beijing, CN;

Xiaohui Jiang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/66 (2006.01); G01N 21/59 (2006.01);
U.S. Cl.
CPC ...
H01L 22/10 (2013.01); G01N 21/59 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01); H01L 2924/0002 (2013.01);
Abstract

An etching time detection means and an etching time detection method for an etching device. The detection means comprises: a light wave emitter fixed on one substrate of the etching device, a light wave receiver fixed on another substrate and opposed to the light wave emitter, a detection system communicated with the light wave emitter and the light wave receiver for receiving light intensity signals and calculating etching time. With the detection means and the detection method, the automatical detection of etching time can be achieved and the deviation caused by visual observation can be effectively avoided.


Find Patent Forward Citations

Loading…