The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Mar. 17, 2016
Applicant:
Electronics and Telecommunications Research Institute, Daejeon, KR;
Inventors:
Moon Youn Jung, Daejeon, KR;
Jisu Lee, Daejeon, KR;
Assignee:
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE, Daejeon, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/84 (2006.01); H01L 21/268 (2006.01); H01L 21/22 (2006.01); H01L 21/223 (2006.01); H01L 21/225 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/268 (2013.01); H01L 21/223 (2013.01); H01L 21/2225 (2013.01); H01L 21/2254 (2013.01); H01L 29/66568 (2013.01);
Abstract
Provided is a method of doping a substrate. The method includes providing the substrate, providing a target material on the substrate, and implanting a dopant of the target material into the substrate by providing a laser beam to the target material.
Jung, Moon. (2018). Method of doping substrate (U.S. Patent No. 9972492). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9972492
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile