The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Mar. 06, 2017
Applicant:
Asm Ip Holding B.v.;
Inventors:
Dong Seok Kang, Cheonan-si, KR;
Yo Chul Jang, Hwaseong-si, KR;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/02 (2006.01); C23C 16/50 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0262 (2013.01); C23C 16/50 (2013.01); C23C 16/54 (2013.01); H01L 21/02661 (2013.01); H01L 21/67196 (2013.01); H01L 21/67201 (2013.01);
Abstract
A plasma stabilization method and a deposition method using the same are disclosed. The plasma stabilization method includes (a) supplying a source gas and (b) supplying a purge gas. The method may also include (c) supplying a reactive gas and (d) supplying plasma. The purge gas and the reactive gas are continuously supplied into a reactor during (a) through (d), and the plasma stabilization method is performed in a state where no substrate exists in the reactor.