The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Sep. 23, 2015
Brother Kogyo Kabushiki Kaisha, Nagoya-shi, Aichi-ken, JP;
National University Corporation Nagoya University, Nagoya-shi, Aichi, JP;
Kazunari Taki, Nagoya, JP;
Kentaro Shinoda, Nagoya, JP;
Hideki Kanada, Toyohashi, JP;
Hiroyuki Kousaka, Nagoya, JP;
Yasuyuki Takaoka, Nagoya, JP;
BROTHER KOGYO KABUSHIKI KAISHA, Nagoya-Shi, Aichi-Ken, JP;
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, Nagoya-Shi, Aichi, JP;
Abstract
A film forming device includes: a microwave supplying unit configured to supply microwaves for generating plasma along a treatment surface of a conductive workpiece; a negative voltage applying unit configured to apply to the workpiece a negative bias voltage for expanding a sheath layer thickness along the treatment surface of the workpiece, and a controller configured to control the microwave supplying unit and the negative voltage applying unit, wherein the microwave supplying unit has a microwave transmitting window configured to propagate the supplied microwaves to the expanded sheath layer, wherein the controller is configured to control the microwave supplying unit and the negative voltage applying unit while supplying of the microwaves so that a sheath thickness of the sheath layer changes.