The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2018

Filed:

Dec. 18, 2015
Applicant:

Seagate Technology Llc, Cupertino, CA (US);

Inventors:

Wei Tian, Eden Prairie, MN (US);

Hauqing Yin, Eden Prairie, MN (US);

Lei Lu, Bloomington, MN (US);

Yong Luo, Plymouth, MN (US);

Joseph Mundenar, Eden Prairie, MN (US);

Assignee:

SEAGATE TECHNOLOGY LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); G11B 5/11 (2006.01);
U.S. Cl.
CPC ...
G11B 5/1272 (2013.01); G11B 5/112 (2013.01); G11B 5/1278 (2013.01);
Abstract

A method includes depositing a layer of pole material on a substrate. The layer of pole material has a bottom surface that is adjacent to the substrate and a top surface that is opposite the bottom surface. A masking material is deposited over a portion of the top surface. Material from the pole material unprotected by the masking material is removed to form a write pole having first and second side walls. At least a portion of a trench formed by removal of the material from the layer of pole material is filled with a sacrificial material. The mask and a portion of the write pole at the top surface are removed to form a beveled trailing edge surface. The sacrificial material is then removed. Front shield gap material is deposited over the beveled trailing edge surface and over portions of the side walls.


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