The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Dec. 06, 2013
Endress + Hauser Gmbh + Co. KG, Maulburg, DE;
Endress + Hauser GmbH + Co. KG, Maulburg, DE;
Abstract
A method for determining and or monitoring at least one process- and/or system specific parameter in automation technology. An oscillatable system is provided, which interacts with a medium located in a container, wherein the oscillatable system is excited to oscillate via a real input signal, wherein the real output signal of the oscillatable system is ascertained, wherein the real output signal is digitized and a real output sequence yu(k) is produced. The real input signal is digitized and a digital input sequence (u(k)) is produced, wherein the digital input sequence (u(k)) is fed to a function block (model), which provides at least one mathematical model of the oscillatable system in interaction with the medium. The mathematical model is defined by a number of process- and/or system specific parameters, wherein via the mathematical model a virtual output sequence (ym(k)) is produced, wherein the virtual output sequence ym(k) is compared with the real output sequence yu(k). In the case of a deviation, at least one process- and/or system specific parameter of the mathematical model is adaptively changed, until the deviation between the virtual output signal and the real output signal of the oscillatable unit lies within a predetermined tolerance range and wherein at least one of the process- and/or system specific parameters is provided.