The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Jul. 18, 2016
Applicants:
Daiji Hara, Kanagawa, JP;
Masato Shimizu, Kanagawa, JP;
Inventors:
Daiji Hara, Kanagawa, JP;
Masato Shimizu, Kanagawa, JP;
Assignee:
TOSOH CORPORATION, Yamaguchi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01L 21/02 (2006.01); C23C 16/30 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); C23C 16/30 (2013.01); C23C 16/50 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01); H01L 21/02274 (2013.01);
Abstract
The present invention relates to a film composed of a carbon-containing silicon oxide formed by CVD using, as the raw material, an organosilicon compound having a secondary hydrocarbon group directly bonded to at least one silicon atom and having an atomic ratio of 0.5 or less oxygen atom with respect to 1 silicon atom, which is used as a sealing film for a gas barrier equipment and materials, an FPD device, a semiconductor device and the like.