The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Oct. 24, 2016
Applicant:
Corning Incorporated, Corning, NY (US);
Inventors:
Xinyuan Liu, Painted Post, NY (US);
Robert George Manley, Vestal, NY (US);
Robert Michael Morena, Lindley, NY (US);
Zhen Song, Painted Post, NY (US);
Assignee:
CORNING INCORPORATED, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); C01B 31/04 (2006.01); C23C 16/26 (2006.01); C03C 17/22 (2006.01); C04B 41/85 (2006.01); C23C 16/02 (2006.01); C23C 16/44 (2006.01); C01B 32/182 (2017.01); C01B 32/186 (2017.01);
U.S. Cl.
CPC ...
C23C 16/26 (2013.01); C01B 32/182 (2017.08); C01B 32/186 (2017.08); C03C 17/22 (2013.01); C04B 41/85 (2013.01); C23C 16/0227 (2013.01); C23C 16/44 (2013.01); C03C 2217/28 (2013.01); C03C 2218/152 (2013.01); Y10T 428/24975 (2015.01); Y10T 428/25 (2015.01); Y10T 428/265 (2015.01); Y10T 428/30 (2015.01);
Abstract
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.