The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Apr. 26, 2016
Samsung Display Co., Ltd., Yongin-Si, Gyeonggi-Do, KR;
Joowoan Cho, Seongnam-si, KR;
Hyunjin Cho, Seoul, KR;
Byoungkwon Choo, Hwaseong-si, KR;
Oleg Prudnikov, Hwaseong-si, KR;
Jeongkyun Na, Suwon-si, KR;
Sanghoon Ahn, Seoul, KR;
Seunghwan Lee, Seoul, KR;
Byoungho Cheong, Yongin-si, KR;
SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;
Abstract
A substrate polishing apparatus includes a support part on which at least one substrate is disposed, a plurality of first moving parts disposed at both opposite sides of the support part in a second direction crossing a first direction, and configured to upwardly extend and reciprocate in the first direction, a second moving part disposed between the plurality of first moving parts in the second direction and connected to an upper side of the first moving parts, a plurality of polishing units disposed at a lower portion of the second moving part and configured to contact an upper surface of the substrate, and a plurality of nozzles disposed at the lower portion of the second moving part and configured to spray slurry to the substrate where the polishing units rotate and revolve along a predetermined trajectory.