The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Mar. 07, 2016
Fenwal, Inc., Lake Zurich, IL (US);
Gregory G. Pieper, Waukegan, IL (US);
Salvatore Manzella, Jr., Barrington, IL (US);
Brian C. Case, Lake Villa, IL (US);
Steven R. Katz, Deerfield, IL (US);
Kyungyoon Min, Kildeer, IL (US);
FENWAL, INC., Lake Zurich, IL (US);
Abstract
Centrifuges are provided for rotating fluid separation chambers about an axis in a fluid processing system. The centrifuge may be provided with high- and low-G walls, with a gap defined between the high- and low-G walls. A first section of the gap may have a substantially uniform radius about the axis, while a second section of the gap may have a non-uniform radius about the axis. The radius of the second section of the gap about the axis at all locations is no larger than the radius of the first section of the gap about the axis. The high-G wall may comprise an inner surface of an outer bowl, while the low-G wall may comprise an outer surface of an inner spool. At least a portion of the second section of the gap may have a varying radius along the axis and/or be configured as a spiral.