The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2018
Filed:
Oct. 11, 2013
Shiseido Company, Ltd., Tokyo, JP;
Takahiro Kishina, Kanagawa, JP;
Katsuyuki Kaneko, Kanagawa, JP;
Amane Tatsuta, Kanagawa, JP;
Yukiko Sato, Kanagawa, JP;
Minako Shudo, Kanagawa, JP;
Masahiko Yamaguchi, Kanagawa, JP;
Hiroyo Usuki, Kanagawa, JP;
Mikino Nosaka, Kanagawa, JP;
Nozomi Takeshita, Kanagawa, JP;
SHISEIDO COMPANY, LTD., Tokyo, JP;
Abstract
A makeup base for skin that is applied to the skin before applying a makeup cosmetic is provided. The makeup base is not smeared or removed by sweat or cold water, but, when rubbed with warm water, is easily removed from the skin together with the makeup cosmetic and without using a cosmetic cleanser. The makeup base includes a water-containing aqueous phase as a continuous phase, which includes (a) a vinyl acetate polymer, (b) polyhydric alcohol, and (c) a hydrophilic nonionic surfactant. The (a) the vinyl acetate polymer is 0.5 to 7 mass % in the makeup base and is dispersed as particles in the aqueous phase, (b) the polyhydric alcohol is 0.5 to 5.5 parts by mass relative to 1 part by mass of (a) the vinyl acetate polymer, and (c) the hydrophilic nonionic surfactant is 1 to 5 mass % in the makeup base.