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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9966531 B1

PDFFull Text
Date of Patent:
May. 08, 2018

Filed:

Oct. 23, 2014

Patterning method for graphene using hot-embossing imprinting

Applicant:

Graphene Square Inc., Seoul, KR;

Inventors:

Byung Hee Hong, Seoul, KR;

Jung Hee Han, Seoul, KR;

Assignee:

Graphene Square, Inc., Seoul, KR;

Attorney:

Greer Burns & Crain, LTD.

Primary Examiner:

Gerard Higgins

Int. Cl.
CPC ...
H01L 51/00 (2006.01); B29C 59/02 (2006.01); B29C 59/04 (2006.01); H01L 29/66 (2006.01); B82Y 40/00 (2011.01); H01L 29/16 (2006.01); B82Y 10/00 (2011.01); B05D 3/12 (2006.01); B32B 37/00 (2006.01); B32B 37/24 (2006.01); B32B 38/06 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0015 (2013.01); B05D 3/12 (2013.01); B29C 59/026 (2013.01); B29C 59/043 (2013.01); B32B 37/025 (2013.01); B32B 37/24 (2013.01); B32B 38/06 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01L 29/1606 (2013.01); H01L 29/66015 (2013.01); H01L 51/0023 (2013.01); B29C 2059/023 (2013.01); B32B 2037/246 (2013.01); H01L 51/0048 (2013.01); Y10T 156/1041 (2015.01); Y10T 428/24802 (2015.01);
Abstract

A patterning method of a graphene, including a step of forming a graphene layer on a polymer substrate; and a step of forming a nanopattern in the graphene layer by hot embossing imprinting. The step of forming a nanopattern in the graphene layer by hot embossing imprinting includes contacting a hot mold, in which a nanopattern is formed, or contacting a roll-to-roll hot mold, in which a nanopattern is formed, to the graphene layer, followed by heating and pressing the graphene layer. In the step of forming a nanopattern in the graphene layer, the graphene layer is cleaved by a protrusion of the nanopattern formed on the hot mold or the hot roll-to-roll mold, and the cleaved graphene is present on each of a protrusion and a recessed portion of the nanopattern formed in the polymer substrate under the graphene later.

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