The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Aug. 02, 2010
Applicants:

Mitsuhiro Suzuki, Nagareyama, JP;

Takeshi Kijima, Nagareyama, JP;

Yuuji Honda, Nagareyama, JP;

Inventors:

Mitsuhiro Suzuki, Nagareyama, JP;

Takeshi Kijima, Nagareyama, JP;

Yuuji Honda, Nagareyama, JP;

Assignee:

YOUTEC CO., LTD., Chiba, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 3/02 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/02197 (2013.01); H01L 21/02337 (2013.01); H01L 21/02356 (2013.01); H01L 21/324 (2013.01);
Abstract

A pressurizing-type lamp annealing device which can easily handle a substrate to be treated having a large surface area. An embodiment of the pressurizing-type lamp annealing device includes: a treatment chamber (); a holding part () disposed in the treatment chamber to hold a substrate to be treated; a gas-introduction mechanism for introducing a pressurized gas into the treatment chamber; a gas-discharge mechanism for discharging the gas in the treatment chamber; a transparent tube () disposed in the treatment chamber; and a lamp heater () placed in the treatment chamber to irradiate the substrate with a lamp light through the transparent tube.


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