The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
May. 30, 2017
Applicant:
National University of Singapore, Singapore, SG;
Inventors:
Assignee:
National University of Singapore, Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C30B 23/02 (2006.01); C30B 29/26 (2006.01); H01L 39/24 (2006.01); C30B 29/22 (2006.01); H01L 21/3205 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02107 (2013.01); C30B 23/02 (2013.01); C30B 29/225 (2013.01); C30B 29/26 (2013.01); H01L 21/02326 (2013.01); H01L 21/3205 (2013.01); H01L 39/2422 (2013.01);
Abstract
A method of in-situ transfer during fabrication of a component comprising a 2-dimensional crystalline thin film on a substrate is disclosed. In one embodiment, the method includes forming a layered structure comprising a polymer, a 2-dimensional crystalline thin film, a metal catalyst, and a substrate. The metal catalyst, being a growth medium for the two-dimensional crystalline thin film, is etched and removed by infiltrating liquid to enable the in-situ transfer of the two-dimensional crystalline thin film directly onto the underlying substrate.